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  5. Nonlinear PCA for source optimization in optical lithography
 
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Nonlinear PCA for source optimization in optical lithography

Source
18th International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2013 IEEE
Date Issued
2013-09-03
Author(s)
Kumar, Pardeep
Srinivasan, Babji
Mohapatra, Nihar Ranjan
Abstract
#NAME?
URI
https://d8.irins.org/handle/IITG2025/30771
Subjects
Kernel PCA
Lithography simulation
Resolution enhancement techniques
Source optimization
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