Nonlinear PCA for source optimization in optical lithography
Source
18th International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2013 IEEE
Date Issued
2013-09-03
Author(s)
Kumar, Pardeep
Srinivasan, Babji
Mohapatra, Nihar Ranjan
Abstract
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Subjects
Kernel PCA
Lithography simulation
Resolution enhancement techniques
Source optimization
