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  4. Controlling the Clamping Voltage in Punch-Through Diodes via N+ Well and Contact Design for Low Voltage System Level ESD Protection
 
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Controlling the Clamping Voltage in Punch-Through Diodes via N+ Well and Contact Design for Low Voltage System Level ESD Protection

Source
9th IEEE Electron Devices Technology and Manufacturing Conference Shaping the Future with Innovations in Devices and Manufacturing Edtm 2025
Date Issued
2025-01-01
Author(s)
Likhitkar, Praful
Maheshwari, Navin
Lashkare, Sandip  
DOI
10.1109/EDTM61175.2025.11040750
Abstract
A low voltage Electrostatic Discharge protection device is essential for low-voltage interfaces such as low-voltage MDIOs, Next-gen USB, and Thunderbolt interfaces. Here, a four-layer (n<sup>++</sup>p<sup>+</sup>p<sup>-</sup>n<sup>+</sup>) punch through diode is studied comprehensively, emphasizing lowering clamping voltage (Vclamp) by reducing dynamic resistance (RDYN). Further, two advanced designs with multi-contact & n+ well design are proposed to reduce the RDYN. The n+ well design lowers the RDYN by ~ 30%, lowering the Vclamp and enhancing IC protection.
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URI
https://d8.irins.org/handle/IITG2025/28337
Subjects
Clamping Voltage | Dynamic Resistance
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