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  4. Modeling of Quantum Confinement and Capacitance in III-V Gate-All-Around 1-D Transistors
 
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Modeling of Quantum Confinement and Capacitance in III-V Gate-All-Around 1-D Transistors

Source
IEEE Transactions on Electron Devices
ISSN
00189383
Date Issued
2017-12-01
Author(s)
Ganeriwala, Mohit D.
Yadav, Chandan
Ruiz, Francisco G.
Marin, Enrique G.
Chauhan, Yogesh Singh
Mohapatra, Nihar R.  
DOI
10.1109/TED.2017.2766693
Volume
64
Issue
12
Abstract
In this paper, a physics-based compact model for calculating the semiconductor charges and gate capacitance of III-V nanowire (NW) MOS transistors is presented. The model calculates the subband energies and the semiconductor charges by considering the wave function penetration into the gate insulator, effective mass discontinuity at the semiconductor-oxide interface, 2-D confinement in the NW, and Fermi-Dirac statistics. The semiconductor charge expression proposed in this paper is completely explicit in terms of applied gate voltage, therefore, making it highly suitable for large circuit simulations. The model is also compared with the results from self-consistent Schrödinger-Poisson solver for different NW sizes and materials and found to be accurate over a wide range of gate voltages.
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URI
https://d8.irins.org/handle/IITG2025/23002
Subjects
Circuit simulation | density of states (DOS) | III-V | MOS transistor | nanowire (NW) | quantum capacitance
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