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  4. On-Voltage Designability by Triangular Barrier Engineering in Bipolar Silicon NIPIN-Selector for Asymmetric Bipolar RRAM
 
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On-Voltage Designability by Triangular Barrier Engineering in Bipolar Silicon NIPIN-Selector for Asymmetric Bipolar RRAM

Source
IEEE Electron Devices Technology and Manufacturing Conference Strengthening the Globalization in Semiconductors Edtm 2024
Date Issued
2024-01-01
Author(s)
Kumar, Hemant
Sakhuja, Jayatika
Lashkare, Sandip  
Ganguly, Udayan
DOI
10.1109/EDTM58488.2024.10511482
Abstract
Non-linear threshold selectors are essential for leakage current mitigation in memristor crossbar arrays. In recent works, vertical 4~F2 bipolar n+/i/δp+/i/n+Si(NIPIN) selector exhibiting ∼ 120mV/decade subthreshold slope has been demonstrated. Bipolar asymmetric resistive RAM(RRAM) requires a bipolar asymmetric selector. Here, we show the modulation of the intrinsic(i) region width to design the threshold voltage on either polarity. The voltage requirement is relatively reduced by excess voltage, reducing power consumption with asymmetric selectors for array operations.
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URI
https://d8.irins.org/handle/IITG2025/29152
Subjects
asymmetric-NIPIN selector | Bipolar-RRAM | crossbar arrays | voltage designability
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