Kumar, PardeepPardeepKumarSrinivasan, BabjiBabjiSrinivasanMohapatra, Nihar RanjanNihar RanjanMohapatra2025-09-042025-09-042013-09-03https://d8.irins.org/handle/IITG2025/30771#NAME?en-USKernel PCALithography simulationResolution enhancement techniquesSource optimizationNonlinear PCA for source optimization in optical lithographyConference Paperpp. 216-219Conference Paper123456789/493