Processing-structure-property correlations in thin film deposition via molecular dynamics simulations
Source
Indian Institute of Technology, Gandhinagar
Date Issued
2024-01-01
Author(s)
Raj, Kishalay
Subjects
Thin Film
Molecular Simulations
Interatomic Potentials
Au-Cr-SiO2
Deposition Energy
Annealing
Coefficient-Thermal Expansion
Tensile Properties
Viscoelastic Properties