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  5. Epitaxial growth of FCC metals on various crystallographic surfaces of NaCl
 
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Epitaxial growth of FCC metals on various crystallographic surfaces of NaCl

Source
Microscopy and Microanalysis
Date Issued
2021-08-01
Author(s)
Dish, Nilabh
Satyaprasad, A.
Gautam, Abhay Raj Singh
DOI
10.1017/S1431927621011727
Volume
vol. 27
Abstract
Interest in epitaxially grown thin films has seen an exponential growth over the decades due to their significant scientific and technological impact. Techniques combining various substrates and vapor deposition techniques have been used to grow a range of crystallographically oriented thin films. One of the earlier approaches involved the use of freshly cleaved (100) surface of a single crystal NaCl to grow (100) oriented films of various metals through physical vapor deposition process. This offers a very efficient and convenient method of producing free-standing, oriented single-crystal metal films.
Publication link
https://www.cambridge.org/core/services/aop-cambridge-core/content/view/90A48D288D1D25298B34F5E12D58E147/S1431927621011727a.pdf/div-class-title-epitaxial-growth-of-fcc-metals-on-various-crystallographic-surfaces-of-nacl-div.pdf
Sherpa Url
https://v2.sherpa.ac.uk/id/publication/2123
URI
https://d8.irins.org/handle/IITG2025/30175
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