Enhanced ESD Protection Techniques for 10V Neurostimulator Circuits in 65nm CMOS Technology
Source
9th IEEE Electron Devices Technology and Manufacturing Conference Shaping the Future with Innovations in Devices and Manufacturing Edtm 2025
Date Issued
2025-01-01
Author(s)
Abstract
A custom Electrostatic Discharge (ESD) protection circuit is essential for the reliability of 10-V neurostimulators implemented in a standard low-voltage CMOS process. The typical foundry-provided ESD diode cannot protect the ESD event without compromising on area. Here, we propose a custom ESD protection design in 65nm CMOS technology within the given area of 57 X 72 μm<sup>2</sup>, limited to pad size. The dynamic resistance (R<inf>dyn</inf>) of the proposed design is 3Ω which is > 10X lower as compared to the foundry-provided design (31.93 Ω) providing substantially lower clamping voltage (~12V) than the oxide breakdown limit (16V).
Subjects
Dynamic Resistance | Electrostatic Discharge
