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  4. Enhanced ESD Protection Techniques for 10V Neurostimulator Circuits in 65nm CMOS Technology
 
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Enhanced ESD Protection Techniques for 10V Neurostimulator Circuits in 65nm CMOS Technology

Source
9th IEEE Electron Devices Technology and Manufacturing Conference Shaping the Future with Innovations in Devices and Manufacturing Edtm 2025
Date Issued
2025-01-01
Author(s)
Das, Tanay
Ahmad, Naef
Somappa, Laxmeesha
Lashkare, Sandip  
DOI
10.1109/EDTM61175.2025.11041318
Abstract
A custom Electrostatic Discharge (ESD) protection circuit is essential for the reliability of 10-V neurostimulators implemented in a standard low-voltage CMOS process. The typical foundry-provided ESD diode cannot protect the ESD event without compromising on area. Here, we propose a custom ESD protection design in 65nm CMOS technology within the given area of 57 X 72 μm<sup>2</sup>, limited to pad size. The dynamic resistance (R<inf>dyn</inf>) of the proposed design is 3Ω which is > 10X lower as compared to the foundry-provided design (31.93 Ω) providing substantially lower clamping voltage (~12V) than the oxide breakdown limit (16V).
Unpaywall
URI
https://d8.irins.org/handle/IITG2025/28375
Subjects
Dynamic Resistance | Electrostatic Discharge
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